Универсальный англо-русский словарь. Академик.ру. 2011.
direct-write electron-beam lithography — tiesioginė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая… … Radioelektronikos terminų žodynas
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… … Wikipedia
lithographie par faisceau d'électrons à enregistrement direct — tiesioginė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая… … Radioelektronikos terminų žodynas
Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Elektronenstrahllithografie für direkte Waferbelichtung — tiesioginė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая… … Radioelektronikos terminų žodynas
tiesioginė elektronpluoštė litografija — statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая литография, f pranc. lithographie par faisceau d … Radioelektronikos terminų žodynas
непосредственная электронно-лучевая литография — tiesioginė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая… … Radioelektronikos terminų žodynas
nanotechnology — /nan euh tek nol euh jee, nay neuh /, n. any technology on the scale of nanometers. [1987] * * * Manipulation of atoms, molecules, and materials to form structures on the scale of nanometres (billionths of a metre). These nanostructures typically … Universalium
Nanotechnology — Part of a series of articles on … Wikipedia
